Research opportunities are available to develop and advance measurement methods required for current and future semiconductor manufacturing processes. Areas of particular interest include the following: (1) optical metrology for extreme ultraviolet (EUV) lithography with an emphasis on the optical properties of EUV materials and the quantification of surface damage due to EUV-induced chemical reactions involving residual vacuum gases, (2) determinations of the outgassing rate of water vapor and other molecules from surfaces, (3) development of holographic microscopy for critical defect inspection, (4) characterization of EUV sources and optics, (5) advancement of optical scatterometry for assessing surface contamination and critical dimensions, (6) accurate measurement of the linear and nonlinear properties of optical materials being considered for next-generation lithographic techniques, and (7) determination of the physical properties of important precursor gases used in semiconductor manufacturing.

 

key words

EUV lithography; Holographic microscopy; Extreme ultraviolet radiation; EUV damage; Optical scatterometry; Semiconductor manufacturing;

Citizenship:  Open to U.S. citizens

Level:  Open to Postdoctoral applicants