Opportunity at National Institute of Standards and Technology (NIST)
Metrology for Semiconductor Manufacturing
Physical Measurement Laboratory, Sensor Science Division
Please note: This Agency only participates in the February and August reviews.
|John H. Burnett
|Thomas Avery Germer
|Steven E. Grantham
|Jay Howard Hendricks
||202 740 8633
|Heather Jean Patrick
Research opportunities are available to develop and advance measurement methods required for current and future semiconductor manufacturing processes. Areas of particular interest include the following: (1) optical metrology for extreme ultraviolet (EUV) lithography with an emphasis on the optical properties of EUV materials and the quantification of surface damage due to EUV-induced chemical reactions involving residual vacuum gases, (2) determinations of the outgassing rate of water vapor and other molecules from surfaces, (3) development of holographic microscopy for critical defect inspection, (4) characterization of EUV sources and optics, (5) advancement of optical scatterometry for assessing surface contamination and critical dimensions, (6) accurate measurement of the linear and nonlinear properties of optical materials being considered for next-generation lithographic techniques, and (7) determination of the physical properties of important precursor gases used in semiconductor manufacturing.
EUV lithography; Holographic microscopy; Extreme ultraviolet radiation; EUV damage; Optical scatterometry; Semiconductor manufacturing;
Open to U.S. citizens
Open to Postdoctoral applicants