Opportunity at National Institute of Standards and Technology (NIST)
Secondary Ion Mass Spectrometry (SIMS)
Material Measurement Laboratory, Materials Measurement Science Division
Please note: This Agency only participates in the February and August reviews.
Secondary ion mass spectrometry (SIMS) is used for chemical and isotopic analysis of micrometer-scale volumes of material. Dynamic SIMS continuously sputters a sample, modifying the sample surface chemistry with the primary implanted species, to achieve trace element sensitivity down to nmol/mol (parts per billion) or isotope fractionation determinations down to one part in one thousand or better. Both large- and small-geometry dynamic SIMS instruments are available at NIST. Current projects include improving and standardizing actinide particle analyses, quantifying solar wind ion implants in collector materials from NASA's Genesis Discovery Mission, and developing new measurement paradigms (e.g., new primary ion species, sample flooding species, and multicollection schemes).
SIMS; particles; semiconductors; mass spectrometry; surface analysis
Open to U.S. citizens
Open to Postdoctoral applicants