Opportunity at U.S. Army Research Laboratory (ARL)
Research on High-Energy-Density Dielectrics and Capacitors for Power Electronics and Pulsed Power Applications
Sensors Electron Devices Directorate, Electrochemistry and Energy Sciences
||Adelphi, MD 207831197
|Jow, T. Richard
In the current and future propulsion and more electrified systems, capacitors are essential in power electronic circuits for efficient power conditioning. In future electromagnetic based guns, protection systems and directed energy systems, capacitors are also essential for providing needed pulsed power for the operation of these systems. Current capacitors cannot meet the high-temperature, high-energy density and graceful fading that are required for the propulsion and other electrified systems. Similarly, the state-of-the-art capacitors are too bulky to fit into the platforms for most of the pulse power applications.
To meet the challenges, our work focuses on the following areas. The first area includes the identification of high-energy-density high-temperature polymeric dielectrics and the development of process for fabrication of promising dielectrics into high quality capacitor grade films. The second area, relating to conversion of the dielectric films before they are assembled into capacitors, includes the metallization and coating techniques for enhancing self-clearing, at the same time, current carrying capability. The third area involves development of novel designs and assembly methods for minimizing the field enhancement at the dielectric edge and maximizing the use of dielectrics for high-energy density and high voltage packaging for pulsed power applications. The fourth area includes the development of pulse power systems optimizing capacitors with other components such as switches and loads.
Qin SC, et al: IEEE Electrical Insulation Magazine 27(1): 1, 2011
Ho J, Jow TR, Boggs S: IEEE Electrical Insulation Magazine 26(1): 20, 2010
Dielectrics; Capacitors; Dielectric constant; Breakdown strength; Power electronics; Pulsed power;
Open to U.S. citizens, permanent residents and non-U.S. citizens
Open to Postdoctoral applicants