The objective of this research is to elucidate the structure, dynamics, and chemistry of molecules interacting with organic, metal, semiconductor, and insulator surfaces for a variety of device applications. Emphasis is placed on determining reaction kinetics and identifying reaction mechanisms and intermediates. Specific interests include growth of organic/polymeric thin films and structures for optical and microelectronics applications, heterogeneous catalysis, or chemical modification/functionalization of surfaces. Facilities include several ultrahigh vacuum systems equipped for infrared reflection-absorption spectroscopy, temperature programmed desorption, low-energy electron diffraction, x-ray photoelectron spectroscopy, and Auger electron spectroscopy. Sample load-lock transfer mechanisms, gas handling, and substrate temperature control are included.