The goal of this project is to fabricate novel nano-engineered thin-film materials and measure their electromagnetic properties in the 1-100 GHz regime. The materials include nanostructured materials, composite ferromagnetic-ferroelectric materials, “left-handed” materials, and frequency-tunable materials. The materials can be fabricated using an ultra-high vacuum, eight-source sputtering system; a laser ablation system; and optical and e-beam lithography systems. The dielectric and magnetic properties can be engineered by patterning arrays of elements on two different length scales. Patterning on a scale comparable to the excitation wavelength-about 1 mm-will allow the development of artificial crystals (photonic band gap materials) in the microwave regime. Patterning on a scale much shorter than the wavelength, 10-100 nm, will allow the permittivity, permeability, and conductivity to be engineered and controlled to have new functionalities. Examples of such materials engineering include light- and field-tunable exchange coupling, low loss amorphous/nanoparticle composites, negative-ε negative-μ (“left handed”) systems, and ferroelectric-ferromagnetic multilayers. Measurements will be conducted on state-of-the-art, 100 GHz microwave test systems and cryogenic microwave probe stations.
Ferroelectric; Ferromagnetic; Frequency-tunable materials; High frequency; Metamaterials; Microwave materials; Photonic bandgap;