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RAP Lab Opportunities at NIST

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Opportunity at National Institute of Standards and Technology (NIST)

Metrology for Semiconductor Manufacturing

Location

Physical Measurement Laboratory, Sensor Science Division

RO# Location
50.68.51.B7534 Gaithersburg, MD

Please note: This Agency only participates in the February and August reviews.

Advisers

Name E-mail Phone
Burnett, John H. john.burnett@nist.gov 301.975.2679
Germer, Thomas Avery thomas.germer@nist.gov 301.975.2876
Grantham, Steven E. grantham@nist.gov 301.975.5528
Hendricks, Jay Howard jay.hendricks@nist.gov 301.975.4836
Patrick, Heather Jean heather.patrick@nist.gov 301.975.4684

Description

Research opportunities are available to develop and advance measurement methods required for current and future semiconductor manufacturing processes. Areas of particular interest include the following: (1) optical metrology for extreme ultraviolet (EUV) lithography with an emphasis on the optical properties of EUV materials and the quantification of surface damage due to EUV-induced chemical reactions involving residual vacuum gases, (2) determinations of the outgassing rate of water vapor and other molecules from surfaces, (3) development of holographic microscopy for critical defect inspection, (4) characterization of EUV sources and optics, (5) advancement of optical scatterometry for assessing surface contamination and critical dimensions, (6) accurate measurement of the linear and nonlinear properties of optical materials being considered for next-generation lithographic techniques, and (7) determination of the physical properties of important precursor gases used in semiconductor manufacturing.

 

Keywords:
EUV lithography; Holographic microscopy; Extreme ultraviolet radiation; EUV damage; Optical scatterometry; Semiconductor manufacturing;

Eligibility

Citizenship:  Open to U.S. citizens
Level:  Open to Regular applicants
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